| |
Ñõ»¯Îï (Oxide)
| Ñõ»¯Îï (Oxide) |
²ÄÁÏ
(Material) |
·Ö×Óʽ
(Formula) |
Íâ¹Û
(Form) |
ÕÛÉäÂÊ
@550nm
(Refractive Index) |
ÃܶÈ
g/cm3
(Density) |
͸¹ýÇø¼ä
nm
(Transparency Range) |
ÈÛµã
¡ãC
(Melting Point) |
Õô·¢Î¶È
¡ãC
(Evaporation Temperature) |
Õô·¢·½Ê½
(Evaporation Source) |
| Aluminium
Oxide |
Al2O3 |
granule |
1.63 |
3.94 |
200-5000 |
2050 |
2000-2200 |
E |
| Cerium ( IV )
Oxide |
CeO2 |
granule |
2 |
~7.3 |
400-16000 |
2600 |
2000 |
E |
| Chromium ( III
) Oxide |
Cr2O3 |
granule |
2.4 @1800nm |
5.21 |
1200-10000 |
2435 |
1900-2000 |
W |
| Hafnium ( IV )
Oxide UV |
HfO2 |
granule, tablet |
1.9 |
9.68 |
230-7000 |
2812 |
2300-2500 |
E |
| Iron ( III )
Oxide |
Fe2O3 |
granule |
3 |
5.3 |
¡¡ |
1594 |
¡¡ |
E, W |
| Lanthanum
Oxide |
La2O3 |
granule |
2 |
7.2 |
¡¡ |
2200 |
¡¡ |
E, W, Ta |
| Magnesium
Oxide |
MgO |
granule |
1.7 |
3.6 |
200-8000 |
2640 |
1700 |
E, W |
| Niobium Oxide |
Nb2O5 |
granule |
2.3 |
4.5 |
350-10000 |
1520 |
1800-1900 |
E |
| Silicon
Monoxide |
SiO |
granule |
1.8 @1000nm |
2.13 |
800-8000 |
1702 |
1200-1600 |
E, Mo, Ta, W |
| Silicon
Dioxide |
SiO2 |
granule, tablet |
1.46 |
2.32 |
200-2000 |
1713 |
1800-2200 |
E |
| Tantalum ( V )
Oxide |
Ta2O5 |
granule |
2.1 |
8.2 |
350-7000 |
1750-1910 |
1900-2200 |
E |
| Titanium ( II
) Oxide |
TiO |
granule |
2.4 |
4.9 |
400-12000 |
1750 |
1700-2000 |
E, Ta, W |
| Titanium ( III
) Oxide |
Ti2O3 |
granule |
2.4 |
¡¡ |
400-12000 |
1640 |
1800-2000 |
E, Ta, W |
| Titanium ( IV
) Oxide |
TiO2 |
granule, tablet |
2.4 |
4.2 |
400-12000 |
1855 |
2000-2200 |
E |
| Yttrium Oxide |
Y2O3 |
granule |
1.79 |
5 |
250-8000 |
2410 |
2300-2500 |
E |
| Zinc Oxide |
ZnO |
granule |
2 |
5.6 |
400-16000 |
1975 |
1000-1210 |
E |
| Zirconium ( IV
) Oxide |
ZrO2 |
granule, tablet |
2.05 @500nm |
5.7g |
320-7000 |
2720 |
2500 |
E |
| Indium Tin
Oxide |
ITO |
granule, tablet |
2 |
2.56g |
400-1000 |
2200 |
1400-1500 |
E, Al2O3 |
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